We have a unique and exciting opportunity to join a dynamic and innovative Technology Development team, focused on conceiving and demonstrating the technologies required for next generations of high-power extreme ultraviolet (EUV) light sources. The EUV source technology development team is responsible for identifying system-level operating points for stable EUV production generated from laser produced plasmas and helps to chart the path to increase EUV power to meet the future needs of the Lithography industry. Based on a laser produced plasma (LPP) interaction with a stream of stable Tin droplets running at a rate of tens of thousands of times per second, our light source relies on a wide range of unique and challenging technologies including laser light amplification, high-pow