Schrödinger, a leader in the field of computational materials chemistry, seeks a Plasma Deposition Intern to develop, test and evaluate approaches for the atomic-scale simulation of plasma-enhanced deposition and etching. The ideal candidate will have a strong interest in chemical deposition/etching processes (such as CVD, ALD, dry etching, ALE) and ideally some direct experience of plasma-enhanced processes (PEALD, RIE etc) via their own research, whether experimental or computational.  Training in the use of Schrödinger computational tools will be provided during the internship. A successful candidate will: